An LED-based heating system for wet-clean processes
LED Heating System
Overview
Heating the wafer with light
Light energy emitted by the LEDs is absorbed by the wafer and its surface films, then converted into heat. This photothermal effect raises the wafer–chemical interface temperature quickly and accelerates the process reaction. Independent multi-channel drive corrects the temperature gap between wafer centre and edge with precision.
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Heating Principle
Light becomes heat inside the wafer
- Light irradiationLED light energy is cast evenly across the whole wafer
- Light absorptionThe wafer and its surface films absorb that energy selectively
- Photothermal conversionThe absorbed energy turns to heat and warms the wafer–chemical interface fast
Line-up
150℃ medium and 350℃ high end
Medium · Standard
For mid-temperature processes
- Wafer at 150℃ · up to 250℃
- Uniformity ±3% (Dry) · ±1% (Wet)
High · High End
For high-temperature processes · precision control
- Wafer at 350℃ · up to 400℃
- Uniformity ±3% (Dry) · ±1% (Wet)
CONTROLLER
High-speed precision control, in a smaller body
A large, complex control cabinet becomes one compact controller. Less installation space, more freedom in equipment design.
- Size280 x 510 x 75mm ultra-compact body
- Weight10kg ultra-light design
- Power9KW-class high-capacity output control
- ControlHigh-speed multi-channel control of LED heaters
- SoftwarePrecision control on an in-house developed GUI
From heater to software, one complete system
From heater design and build to the dedicated controller and our in-house GUI, HS HI-TECH delivers every step itself.
ONE COMPANY · ONE SYSTEM · ONE-STOP SUPPORT
Direct wafer heating by LED photothermal technology, built on our patents
From irradiating, absorbing and converting LED light energy to whole-wafer and edge heating with precise multi-channel drive, HS HI-TECH sets a new standard for wafer heating on its own patented technology.
| Patent number | Title | Description |
|---|---|---|
| KR 10-2102277 | Zone-independent control | Each heating zone is controlled individually for a uniform temperature across the whole wafer. |
| KR 10-2244605 | Advanced LED heating structure | An LED heating structure optimised for wafer processing raises efficiency and stability. |
| KR 10-2232654 | Wafer edge heating | Inclined LEDs heat the wafer edge effectively. |
| KR 10-2888196 | Multi-channel precision control | Independent control per channel delivers precise, uniform heating even in high-temperature processes. |
The difference in technology shows in the result
More uniform heat · more precise control · a more stable process. Patent-backed LED heating from HS HI-TECH is the optimal solution for process efficiency and higher productivity.
